KUALA LUMPUR, March 27 (Bernama) -- Dai Nippon Printing Co Ltd (DNP) has begun development of a photomask manufacturing for 2-nanometre (nm) generation logic semiconductors that support Extreme Ultra-Violet (EUV) lithography, the cutting-edge process for semiconductor manufacturing.
DNP in a statement said it will also act as a subcontractor and provide the newly developed technology to Tokyo-based Rapidus Corporation (Rapidus).
Rapidus participated in the Research and Development Project of the Enhanced Infrastructures for Post-5G Information and Communication Systems instigated by the New Energy and Industrial Technology Development Organization (NEDO).
In response to the need for further miniaturisation, DNP will begin full-scale development of a photomask manufacturing process for 2nm generation EUV lithography, including the operation of second and third multi-electron beam mask lithography systems in fiscal year (FY) 2024.
The company plans to bring online its second and third MBMW mask lithography systems in FY 2024, accelerating the development of photomasks for 2nm generation EUV lithography.
It has strengthened its ability to manufacture cutting-edge semiconductors with high productivity and quality, being the world's first merchant photomask manufacturer to introduce the multi-beam mask writing tool (MBMW); and completed the development of a photomask manufacturing process for 3nm generation EUV lithography and commenced development of 2nm generation technology, in 2016 and 2023, respectively.
By FY 2025, DNP will complete the development of a manufacturing process for photomasks for 2nm generation logic semiconductors that support EUV lithography. From FY 2026 onwards, it will push ahead with the establishment of production technology with a view to commencing mass production in FY 2027.
It has also begun development with an eye toward the 2nm generation and beyond, and has signed an agreement with imec, a cutting-edge international research organisation headquartered in Leuven, Belgium, to jointly develop next-generation EUV photomasks.
DNP will continue to contribute to the growth of Japan's semiconductor industry by promoting development in collaboration with various partners within the framework of the international semiconductor industry.
-- BERNAMA
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